News

12.28.2011
New WCPCs from MSP

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M1110 & M1120 Water-Based Condensation Particle Counters (WCPC) are the latest addition to our growing particle counter and size spectrometer product line. The 3 L/min M1110 is ideally suited for contaminant particle detection in the cleanroom and high purity gases. The 1.0 L/min M1120 is intended for laboratory research and air quality/air pollution monitoring applications.

 

 

12.28.2011
MSP's Turbo Vaporizers

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MSP’s Turbo-Vaporizers™ are known for their ability to vaporize liquid-source chemicals to form thin-films with minimal thermal decomposition, by-product formation and wafer particle contamination.  These production-quality vaporizers are used in a variety of semiconductor processes from hi-k DRAM capacitors to conventional dielectric films by CVD, PECVD, and ALD in single-wafer and batch tools. Contact MSP today to get our expert help in solving your most difficult film deposition problems with our M2800-series Turbo Vaporizers. We provide customized solutions for each individual customer.

 

 

12.28.2011
Real-Time Fiber Monitor

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The M7400AD is a real time fiber monitor to detect and counts airborne fibers such as asbestos, mineral wool, advanced composites, ceramic and glass. Each 7400AD is factory-calibrated with traceability to NIOSH Method 7400 for asbestos fibers. The 7400AD ignores non-fibrous background particles using the proven principle of electric-field-induced fiber alignment and oscillation.

 

 

12.28.2011
FlowCytoPrep from MSP

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The M5000 FlowCytoPrep is the first fully automated broad-spectrum sample preparation system to enable automated bioprocess monitoring by a flow cytometer. The system can operate 24 hours a day, 7 days a week with minimal operator intervention for:

  • Bioprocess monitoring
  • Cell line development and optimization
  • Media development and optimization
  • Quality control
  • Rare event screening
  • Complex assay execution

 

12.28.2011
PSL, silica-sphere and process-particle wafers and Deposition Systems

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These particle wafers are created by our in-house M2300 NPT Particle Deposition System with

  • differential mobility analyzer (DMA) technology for accurate particle sizing and size classification and
  • automated NIST traceable calibration routine
for calibrating KLA-Tencor, Applied Materials, TopCon, Hitachi and other wafer surface inspection tools:
  • Available for 200, 300 and 450 mm wafers
  • True 20nm deposition capability
  • ±2% particle size accuracy for particles >50nm and ±1.0nm for particles <50nm
  • Full deposition and pattern deposition (spot, arc, and ring)